High purity quartz cleaning tanks are designed for critical wafer cleaning processes in semiconductor manufacturing, where material purity and chemical resistance are essential. Fabricated from ultra-high purity fused quartz, these tanks offer exceptional resistance to strong acids and oxidizing agents, including HF, H₂SO₄, and HCl, making them ideal for RCA, SC-1/SC-2, and other wet cleaning procedures.

With ultra-smooth interior surfaces and excellent thermal stability, these tanks minimize particle generation, prevent ion contamination, and maintain structural integrity during high-temperature chemical baths. Their precise dimensions ensure consistent wafer immersion and uniform chemical flow, supporting defect-free wafer preparation and high process yield.