The 6 inch quartz sprinkler achieves accurate and even distribution of process gases or liquids within semiconductor reactors or furnaces. Its high purity quartz construction resists extreme temperatures and harsh chemical environments while still maintaining the utmost performance and purity.

Utilizing advanced fluid mechanics, the specially designed novel gas vapor rotary sprinklers quartz force nozzles provide uniform distribution of the gas or vapor, lessening local concentration gradients and ensuring that every wafer is uniformly treated. Modifying existing tools and adding pliable structures marks the importance of the quartz sprinkler for other integrated processes and advanced techniques such as chemical vapor deposition (CVD) and oxidation, increasing process control, consistency, device yield, and process yield.